Title

Oxidation Of Tungsten And Tungsten Based Alloys

Date

1962

Index Abstract

Coming Soon

Photo Quality

Complete

Report Number

WADC TR 59-575 Part 3

Creator

Gulbransen, E.A.

Andrew, K.F.

Corporate Author

Westinghouse Electric Corp Pittsburgh PA

Laboratory

Directorate of Materials and Processes

Extent

66

Identifier

AD0285588

Access Rights

OTS

Distribution Classification

1

Contract

AF 33(616)-7888

DoD Project

7351 - Metallic Materials

DoD Task

735101

DTIC Record Exists

No

Distribution Change Authority Correspondence

None

Date Modified

Scanned by request 11/12/2007 submitted by a Private Citizen (No Known Affiliation)

Abstract

The rates of oxidation of W were determined from 1150 to 1 15 C in oxygen pressure of 2 to 100 Torr. Very high rates of oxidation or surface recession rates wer found above 1200 C. An exponential temperature behavior for the rate of oxidation was found for all of the pressure studied. A theoretical analysis of the data usi g the absolute reaction rate theory suggested that the rate of oxidation of tungsten was limited by a mobile absorption process of oxygen onto a tungsten surface already covered by a surface layer of oxide. Oxidation of a 50 w/o Ta-W alloy was studied over the temperature range of 1068 to 1458 C at 152 Torr oxygen pressure. A protective scale was formed on this alloy. The oxidation resistance was improved o a considerable extent over that of either of the pure metals or of other tu gsten-tantalum alloys. A special 250 kv electron diffraction camera was developed for the study of the W-gas reacting interface. Preliminary diffraction data were obtained on the oxidation of W between 800 and 1000 C

Report Availability

Full text available

Date Issued

1962-07

Provenance

Lockheed Martin Missiles & Fire Control

Type

report

Format

1 online resource